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From: Dudo (dudomail_at_gmail.com)
Date: Wed Feb 08 2012 - 18:47:01 CST
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http://www.youtube.com/watch?v=HZbR6w0Y7xU
On Thu, Feb 9, 2012 at 12:35 AM, kirtana S <skirtana4_at_gmail.com> wrote:
> I am using the coarse grain plugin in VMD. The method used is residue
> based coarse graining method.I have some questions
> on the CG database file format.
> What does the numbers specified on the third column of the file
> represent.Again why we have H2O and OH2.
> Is this for 3 monomer units of water.
> I am using this for a polymer chain polystyrene. Here each monomer
> represents a single residue.So Should I do this as below
> CGBEGIN
> RES1  (C6H6)CH3  0
> RES1   C1        0
> RES1   C2        0
> RES1   C3        0
> RES1   C4
> RES1   C5
> RES1   C6
> RES1   C7
> RES1   C8
> RES1   H1
> RES1   H2
> RES1   H3
> RES1   H4
> RES1   H5
> RES1   H6
> RES1   H7
> RES1   H9
> RES1   H10
> RES2   (C6H6)CH2
> RES2   C1
> RES2   C1
>
> And so on till CGEND for all the monomers in the chain or should I change
> . Also when I do this I have loaded .mol2 file.
> This prompts me to have .psf file. Where should I load this .psf file.
>
> Thanks for response
> Kirtana
>
-- ____________________ Ing. Dusan Racko, PhD Polymer Institute of the Slovak Academy of Sciences Dubravska cesta 3 845 41 Bratislava, Slovak Republic tel: +421 2 3229 4321
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